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Vienna, Austria

Ims Nanofabrication Ag

USPTO Granted Patents = 29

EPO Patents = 17

Forward Citations = 814

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22 inventors (with patents filed for the assignee):

Elmar Platzgummer (28 out of 55 patents)

Heinrich Fragner (6 out of 6 patents)

Stefan Cernusca (4 out of 5 patents)

4. Rafael Reiter (2 out of 5 patents)

5. Samuel Kvasnica (2 out of 2 patents)

6. Hans Löschner (2 out of 4 patents)

7. Gerhard Stengl (2 out of 37 patents)

8. Robert Nowak (2 out of 5 patents)

9. Adrian Bürli (2 out of 2 patents)

10. Christoph Spengler (1 out of 17 patents)

11. Markus Wagner (1 out of 3 patents)

12. Klaus Schiessl (1 out of 1 patent)

13. Klaus Schiessel (1 out of 1 patent)

14. Andreas Chylik (1 out of 1 patent)

15. Gerald Kratzert (1 out of 1 patent)

Core Competencies:

Multi-Beam Writing

Charged-Particle Exposure

Dose Compensation

Pattern Definition

Deflector Array

Imaging Deviations

Convolution Kernel

Customizing Tools

Beamlet Compensation

Maskless Exposure

High-Voltage Insulation

Pattern Lock System

29 patents: Sort by Forward Citations

1. 9799487 - Bi-directional double-pass multi-beam writing (2017-10-24),

2. 9653263 - Multi-beam writing of pattern areas of relaxed critical dimension (2017-05-16),

3. 9568907 - Correction of short-range dislocations in a multi-beam writer (2017-02-14),

4. 9520268 - Compensation of imaging deviations in a particle-beam writer using a convolution kernel (2016-12-13),

5. 9495499 - Compensation of dose inhomogeneity using overlapping exposure spots (2016-11-15),

6. 9443699 - Multi-beam tool for cutting patterns (2016-09-13),

7. 9373482 - Customizing a particle-beam writer using a convolution kernel (2016-06-21),

8. 9269543 - Compensation of defective beamlets in a charged-particle multi-beam exposure tool (2016-02-23),

9. 9099277 - Pattern definition device having multiple blanking arrays (2015-08-04),

10. 9093201 - High-voltage insulation device for charged-particle optical apparatus (2015-07-28),

11. 9053906 - Method for charged-particle multi-beam exposure (2015-06-09),

12. 8563942 - Multi-beam deflector array means with bonded electrodes (2013-10-22),

13. 8546767 - Pattern definition device with multiple multibeam array (2013-10-01),

14. 8378320 - Method for multi-beam exposure on a target (2013-02-19),

15. 8304749 - Charged-particle exposure apparatus with electrostatic zone plate (2012-11-06),

Company Overview

Ims Nanofabrication AG, based in Vienna, specializes in advanced nanofabrication technologies, focusing on the development of innovative solutions for the semiconductor and microelectronics industries. The company is recognized for its expertise in electron beam lithography, which enables the precise patterning of nanoscale structures. By leveraging cutting-edge research and technology, Ims Nanofabrication AG aims to enhance manufacturing processes and drive advancements in various applications, including photonics and quantum computing.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

29 Patents

#32 in Vienna

#126 in Austria

#22,570 in the World

Vienna, Austria

Ims Nanofabrication Ag

Forward Citations = 814

22 inventors:

Elmar Platzgummer (28 out of 55 patents)

Heinrich Fragner (6 out of 6 patents)

Stefan Cernusca (4 out of 5 patents)

4. Rafael Reiter (2 out of 5 patents)

5. Samuel Kvasnica (2 out of 2 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Ims Nanofabrication Ag. Retrieved from https://idiyas.com/company/ims-nanofabrication-ag

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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