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Vienna, Austria

Ims Nanofabrication Ag

USPTO Granted Patents = 29

EPO Patents = 17

Forward Citations = 730

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22 inventors (with patents filed for the assignee):

Elmar Platzgummer (28 out of 51 patents)

Heinrich Fragner (6 out of 6 patents)

Stefan Cernusca (4 out of 5 patents)

4. Rafael Reiter (2 out of 5 patents)

5. Samuel Kvasnica (2 out of 2 patents)

6. Hans Löschner (2 out of 4 patents)

7. Gerhard Stengl (2 out of 37 patents)

8. Robert Nowak (2 out of 5 patents)

9. Adrian Bürli (2 out of 2 patents)

10. Christoph Spengler (1 out of 11 patents)

11. Markus Wagner (1 out of 3 patents)

12. Klaus Schiessl (1 out of 1 patent)

13. Klaus Schiessel (1 out of 1 patent)

14. Andreas Chylik (1 out of 1 patent)

15. Gerald Kratzert (1 out of 1 patent)

29 patents: Sort by Forward Citations

1. 9799487 - Bi-directional double-pass multi-beam writing (2017-10-24),

2. 9653263 - Multi-beam writing of pattern areas of relaxed critical dimension (2017-05-16),

3. 9568907 - Correction of short-range dislocations in a multi-beam writer (2017-02-14),

4. 9520268 - Compensation of imaging deviations in a particle-beam writer using a convolution kernel (2016-12-13),

5. 9495499 - Compensation of dose inhomogeneity using overlapping exposure spots (2016-11-15),

6. 9443699 - Multi-beam tool for cutting patterns (2016-09-13),

7. 9373482 - Customizing a particle-beam writer using a convolution kernel (2016-06-21),

8. 9269543 - Compensation of defective beamlets in a charged-particle multi-beam exposure tool (2016-02-23),

9. 9099277 - Pattern definition device having multiple blanking arrays (2015-08-04),

10. 9093201 - High-voltage insulation device for charged-particle optical apparatus (2015-07-28),

11. 9053906 - Method for charged-particle multi-beam exposure (2015-06-09),

12. 8563942 - Multi-beam deflector array means with bonded electrodes (2013-10-22),

13. 8546767 - Pattern definition device with multiple multibeam array (2013-10-01),

14. 8378320 - Method for multi-beam exposure on a target (2013-02-19),

15. 8304749 - Charged-particle exposure apparatus with electrostatic zone plate (2012-11-06),

IMS Nanofabrication AG is a semiconductor equipment manufacturer based in Vienna, Austria. They specialize in nanopatterning systems for advanced semiconductor applications. Their innovative technologies enable the production of complex nanostructures at high resolution and throughput, providing solutions for the next generation of integrated circuits. With a dedicated team of experts and state-of-the-art facilities, IMS Nanofabrication AG continues to drive advancements in nanolithography.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Jan 6 2026

29 Patents

#28 in Vienna

#125 in Austria

#21,885 in the World

Vienna, Austria

Ims Nanofabrication Ag

Forward Citations = 730

22 inventors:

Elmar Platzgummer (28 out of 51 patents)

Heinrich Fragner (6 out of 6 patents)

Stefan Cernusca (4 out of 5 patents)

4. Rafael Reiter (2 out of 5 patents)

5. Samuel Kvasnica (2 out of 2 patents)

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