The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2013
Filed:
Mar. 18, 2011
Elmar Platzgummer, Vienna, AT;
Elmar Platzgummer, Vienna, AT;
IMS Nanofabrication AG, Vienna, AT;
Abstract
For irradiating a target with a beam of energetic electrically charged particles comprising a plurality of beamlets, the target is exposed in a sequence of exposure stripes composed image pixels. These stripes (ss) are, at their boundaries to adjacent stripes, provided with overlap margins (mm) which are mutually overlapped, so nominal positions of image pixels in the overlap margin (m) overlap, or substantially coincide, with image pixels in the corresponding overlap margin (m). During the exposure of an overlap margin (m), a first subset (n) of image pixels in said overlap margin are exposed while those of a second subset (n), possibly a complementary subset with respect to a desired pattern, are not exposed; contrariwise, during the exposure of the corresponding overlap margin (m), image pixels corresponding to image pixels in the first subset are not exposed, but those corresponding to image pixels in the second subset are.