Location History:
- Vienna, AT (2007 - 2012)
- Innermanzing, AT (2012)
Company Filing History:
Years Active: 2007-2012
Title: Innovator Spotlight: Stefan Cernusca
Introduction:
Stefan Cernusca, a prolific inventor based in Vienna, Austria, has made significant contributions to the field of particle-beam projection processing. With a total of 5 patents to his name, Cernusca's innovative work has been instrumental in advancing technologies related to charged-particle exposure apparatus and multi-beam patterning.
Latest Patents:
1. Charged-particle exposure apparatus with electrostatic zone plate: Cernusca's patented apparatus features a unique plate electrode device with openings corresponding to the apertures of the pattern definition system. This design allows for precise control over the beam of energetic electrically charged particles, enhancing the accuracy and efficiency of particle-beam projection processing.
2. Global point spreading function in multi-beam patterning: In this patent, Cernusca introduces a novel approach to multi-beam structuring by varying the actual location of the beam image within each exposure step. By realizing a distribution of locations within the image plane, Cernusca effectively introduces a homogenous blur across the entire beam image, improving the quality of pattern formation on the target surface.
Career Highlights:
Stefan Cernusca has lent his expertise to renowned companies such as IMS Nanofabrication AG and IMS Nanofabrication GmbH. His innovative solutions and technical prowess have played a pivotal role in shaping the development of cutting-edge technologies in the nanofabrication industry.
Collaborations:
Throughout his career, Cernusca has collaborated with industry peers such as Elmar Platzgummer and Heinrich Fragner. These collaborations have led to the exchange of ideas, the development of new techniques, and the realization of groundbreaking innovations in the field of particle-beam projection processing.
Conclusion:
In conclusion, Stefan Cernusca stands out as a visionary inventor whose pioneering work has significantly advanced the field of particle-beam processing. His dedication to innovation, coupled with his technical acumen, continues to drive progress in nanofabrication technologies, setting new standards for precision and efficiency in the industry.