Company Filing History:
Years Active: 2024-2025
Title: The Innovative Contributions of Stefan Eder-Kapl
Introduction
Stefan Eder-Kapl is a notable inventor based in Vienna, Austria. He has made significant contributions to the field of particle-beam processing and inspection. His work focuses on developing advanced technologies that enhance the efficiency and effectiveness of particle-beam applications.
Latest Patents
Stefan Eder-Kapl holds a patent for a "Beam pattern device having beam absorber structure." This innovative device is designed for use in particle-beam processing or inspection apparatuses. It utilizes a multi-beam pattern definition mechanism that is irradiated with a beam of electrically charged particles through multiple apertures to create corresponding beamlets. The device features an aperture array with various sets of apertures arranged in specific configurations. Additionally, it includes an absorber array that has openings for the passage of selected beamlets. The absorber array is equipped with a charged-particle absorbing structure that effectively confines the effects of irradiated particles and electric charge.
Career Highlights
Stefan Eder-Kapl is currently employed at Ims Nanofabrication GmbH, where he continues to push the boundaries of innovation in nanofabrication technologies. His expertise in particle-beam applications has positioned him as a key figure in the industry.
Collaborations
Throughout his career, Stefan has collaborated with talented individuals such as Elmar Platzgummer and Christoph Spengler. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Stefan Eder-Kapl's contributions to the field of particle-beam processing are noteworthy. His innovative patent and collaborative efforts highlight his commitment to advancing technology in this specialized area. His work continues to influence the future of nanofabrication and particle-beam applications.