Hinterbrühl, Austria

Matthias Liertzer

This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Ims Nanofabrication Gmbh. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Matthias Liertzer. Retrieved from https://idiyas.com/inventor/matthias-liertzer

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 33.3

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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3 patents (USPTO):Explore Patents

Title: Matthias Liertzer - Innovator in Charged-Particle Processing

Introduction

Matthias Liertzer is an inventor based in Hinterbrühl, Austria. He has made significant contributions to the field of charged-particle processing, particularly through his innovative methods for determining focal properties in multi-beam processing apparatuses. His work focuses on enhancing the precision and accuracy of imaging in these complex systems.

Latest Patent Applications

Matthias Liertzer has filed a patent application titled "Method for Determining Focal Properties in a Target Beam Field of a Multi-Beam Charged-Particle Processing Apparatus." This method involves determining focal properties related to aperture images formed by beamlets at or near the target within the apparatus. By adjusting the electrostatic voltage of a lens or other operating parameters, the landing angles of the beamlets can be tilted, leading to a small displacement of their impact points on the target surface. The application outlines a process for generating a mapping that correlates changes in landing angles to displacement amounts, which can be utilized to extract focal properties and correct imaging errors.

Conclusion

Matthias Liertzer's innovative approach to charged-particle processing represents a significant advancement in the field. His patent application showcases his commitment to improving imaging accuracy in complex systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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