Location History:
- St. Petersburg, RU (2005)
- Carmiel, IL (2010)
- Karmiel, IL (2008 - 2023)
Company Filing History:
7 out of 83 
5 out of 1,405 
2 out of 4 Years Active: 2005-2023
Title: The Innovative Contributions of Sergey Oshemkov
Introduction
Sergey Oshemkov, an accomplished inventor based in Karmiel, Israel, has made significant strides in the field of lithography and particle removal technologies. With a portfolio consisting of 11 patents, he has established himself as a prominent figure in the industry, contributing to advancements in projection exposure apparatus and extreme ultraviolet photolithography.
Latest Patents
Among his latest inventions is a patent for a **Method for Removing a Particle from a Mask System**. This innovative method involves detecting a particle within the mask system and utilizing laser radiation to eliminate the particle. The wavelength of the laser is specifically chosen to match that of the radiation used by the projection exposure apparatus, enhancing its effectiveness.
Another notable patent that he developed is the **Critical Dimension Variation Correction in Extreme Ultraviolet Lithography**. This method addresses the critical dimension variations observed in wafer exposure fields formed by photolithography systems. By mapping these variations, Sergey’s invention determines treatment parameters to correct the reflectance in the multilayer region of photomasks, ensuring the precision required for successful semiconductor fabrication.
Career Highlights
Sergey's career includes pivotal roles at renowned companies such as Carl Zeiss SMS Ltd. and Carl Zeiss SMT GmbH. His experience at these organizations has equipped him with the knowledge and expertise to innovate and develop groundbreaking technologies in the field.
Collaborations
Throughout his career, Sergey has had the privilege of working alongside esteemed colleagues, including Vladimir Dmitriev and Vladimir Kruglyakov. These collaborations have fostered an environment of creative innovation and relentless pursuit of excellence in their respective projects.
Conclusion
Sergey Oshemkov's dedication to advancing technology in lithography and particle removal showcases his value as an inventor. His contributions, evidenced by his impressive patent portfolio, continue to influence the industry and inspire future innovations. With a commitment to quality and precision, Sergey remains a prominent player in the realm of invention and advanced technology.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.