The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2014
Filed:
Apr. 12, 2011
Applicants:
Sergey Oshemkov, Karmiel, IL;
Ralph Klaesges, Aalen, DE;
Markus Mengel, Heidenheim, DE;
Inventors:
Assignees:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Carl Zeiss SMS GmbH., Jena, DE;
Carl Zeiss SMS Ltd, Karmiel, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/72 (2012.01); C03C 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Disclosed is a method of modifying of a surface of a substrate of a photolithographic mask for extreme ultraviolet radiation comprising the step of focusing femtosecond light pulses of a laser system onto the substrate so that a plurality of color centers is generated inside the substrate, wherein the color centers are distributed to cause a modification of the substrate surface.