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D.N. Misgav, Israel

Carl Zeiss Sms Ltd.

USPTO Granted Patents = 83

EPO Patents = 13

Forward Citations = 188

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120 inventors (with patents filed for the assignee):

Vladimir Dmitriev (23 out of 27 patents)

Thomas Scheruebl (9 out of 16 patents)

Michael Arnz (9 out of 20 patents)

4. Klaus Edinger (8 out of 31 patents)

5. Thorsten Hofmann (8 out of 17 patents)

6. Michael Totzeck (7 out of 57 patents)

7. Sergey Oshemkov (7 out of 11 patents)

8. Ofir Sharoni (7 out of 6 patents)

9. Guy Ben-Zvi (7 out of 8 patents)

10. Ulrich Stroessner (7 out of 7 patents)

11. Joachim Welte (6 out of 8 patents)

12. Wolfgang Harnisch (6 out of 9 patents)

13. Rainer Becker (5 out of 7 patents)

14. Erez Graitzer (5 out of 5 patents)

15. Elmar Platzgummer (5 out of 51 patents)

Core Competencies:

Photolithography

Mask Inspection

Optical Systems

Critical Dimension Uniformity

Aerial Image Simulation

Surface Defect Repair

Microscopy Techniques

Particle Removal

Wafer Processing

Optical Component Design

Laser Correction Tools

EUV Mask Defect Repair

83 patents: Sort by Forward Citations

1. 11914289 - Method and apparatus for determining an effect of one or more pixels to be introduced into a substrate of a photolithographic mask (2024-02-27),

2. 11774870 - Method for removing a particle from a mask system (2023-10-03),

3. 11385539 - Method and apparatus for compensating defects of a mask blank (2022-07-12),

4. 11366383 - Method and apparatus for determining positions of a plurality of pixels to be introduced in a substrate of a photolithographic mask (2022-06-21),

5. 11366382 - Method and apparatus for performing an aerial image simulation of a photolithographic mask (2022-06-21),

6. 11249294 - Optical system and method for correcting mask defects using the system (2022-02-15),

7. 10578975 - Method for correcting the critical dimension uniformity of a photomask for semiconductor lithography (2020-03-03),

8. 10353295 - Method and apparatus for generating a predetermined three-dimensional contour of an optical component and/or a wafer (2019-07-16),

9. 10157804 - Method and apparatus for determining a critical dimension variation of a photolithographic mask (2018-12-18),

10. 10114294 - Apparatus and method for imparting direction-selective light attenuation (2018-10-30),

11. 10061192 - Method and apparatus for correcting errors on a wafer processed by a photolithographic mask (2018-08-28),

12. 9798249 - Method and apparatus for compensating at least one defect of an optical system (2017-10-24),

13. 9753366 - Method and apparatus for the determination of laser correcting tool parameters (2017-09-05),

14. 9690191 - Surface defect repair by irradiation (2017-06-27),

15. 9658527 - Correction of errors of a photolithographic mask using a joint optimization process (2017-05-23),

Carl Zeiss SMS Ltd. is a leading provider of optical and optoelectronic solutions. With a focus on precision engineering and innovative technology, the company offers a wide range of products including microscopes, cameras, and measuring systems. Their cutting-edge products cater to industries such as healthcare, research, and manufacturing, ensuring high-quality performance and reliability.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 23 2025

83 Patents

#1 in D.N. Misgav

#65 in Israel

#8,827 in the World

D.N. Misgav, Israel

Carl Zeiss Sms Ltd.

Forward Citations = 188

120 inventors:

Vladimir Dmitriev (23 out of 27 patents)

Thomas Scheruebl (9 out of 16 patents)

Michael Arnz (9 out of 20 patents)

4. Klaus Edinger (8 out of 31 patents)

5. Thorsten Hofmann (8 out of 17 patents)

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