The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2018
Filed:
Mar. 08, 2017
Applicant:
Carl Zeiss Sms Ltd., Karmiel, IL;
Inventor:
Vladimir Dmitriev, Moran, IL;
Assignee:
Carl Zeiss SMS Ltd., Karmiel, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/32 (2006.01); G03B 27/54 (2006.01); G03B 27/72 (2006.01); G03F 1/00 (2012.01); G03F 7/20 (2006.01); G03F 1/38 (2012.01); G03F 1/70 (2012.01); G03F 1/60 (2012.01); G03F 1/72 (2012.01); G03F 1/50 (2012.01);
U.S. Cl.
CPC ...
G03F 7/70125 (2013.01); G03F 1/38 (2013.01); G03F 1/50 (2013.01); G03F 1/60 (2013.01); G03F 1/70 (2013.01); G03F 1/72 (2013.01); G03F 7/7055 (2013.01); G03F 7/70191 (2013.01); G03F 7/70283 (2013.01); G03F 7/70325 (2013.01);
Abstract
Method, apparatus for imparting direction-selective light attenuation. A method for imparting direction-selective light attenuation to a photomask may include assigning different attenuation levels to light rays of different directions of incidence. The method may also include computing an array of shading elements to attenuate the light rays with the assigned different attenuation levels, depending on the direction of incidence of the light rays. The method may further include inscribing the array of shading elements within a substrate of the photomask.