The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2023
Filed:
Aug. 08, 2022
Applicants:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Carl Zeiss Sms Ltd., D.N. Misgav, IL;
Inventors:
Sergey Oshemkov, Karmiel, IL;
Shao-Chi Wei, Weimar, DE;
Joerg Frederik Blumrich, Jena, DE;
Martin Voelcker, Koenigsbronn-Zang, DE;
Thomas Franz Karl Scheruebl, Jena, DE;
Assignees:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Carl Zeiss SMS Ltd., D.N. Misgav, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70925 (2013.01);
Abstract
A method for removing particles from a mask system for a projection exposure apparatus, including the following method steps: detecting the particle in the mask system, providing laser radiation, and removing the particle by irradiating the particle with laser radiation. The wavelength of the laser radiation corresponds to that of used radiation used by the projection exposure apparatus.