Location History:
- Goettingen, DE (2008)
- Koenigsbronn-Zang, DE (2003 - 2023)
Company Filing History:
3 out of 1,409 
2 out of 282 
2 out of 153 
Years Active: 2003-2023
Title: The Innovative Mind of Martin Voelcker
Introduction
Martin Voelcker, an accomplished inventor based in Koenigsbronn-Zang, Germany, has made significant contributions to the field of microlithography with a remarkable portfolio of seven patents. His cutting-edge innovations have advanced technologies used in projection exposure apparatuses, demonstrating a blend of creativity and technical expertise.
Latest Patents
Among his latest patents, Voelcker developed a "Method for Removing a Particle from a Mask System." This innovative technique involves detecting particles within a mask system and utilizing laser radiation to effectively remove them. The laser's wavelength aligns with that of the radiation utilized by the projection exposure apparatus, ensuring precision and efficiency.
Another notable patent is the "Method and Assembly for Characterizing a Mask or a Wafer for Microlithography." This method employs an illumination device to illuminate an object with electromagnetic radiation. It captures intensity distributions through a detector device and performs iterative comparisons between actual measurement values and model-based simulated values. The innovative design involves a multiple-layer model that accurately depicts the object's structure and reflectivity.
Career Highlights
Voelcker's career features employment with prestigious companies such as Carl Zeiss SMT GmbH and Carl Zeiss Jena GmbH. His work in these institutions has positioned him at the forefront of technological advancements in the field of optics and semiconductor processing.
Collaborations
Throughout his career, Martin Voelcker has collaborated with several talented individuals, including Ralf Wolleschensky and Robert Grub. These partnerships have fostered a collective effort toward achieving groundbreaking inventions and improving existing technologies in their respective industries.
Conclusion
Martin Voelcker's dedication to innovation has left a lasting impact on the field of microlithography. His patented methods not only enhance the functionality of projection exposure apparatuses but also showcase the importance of collaboration and continual advancement in technology. As he continues to innovate, the industry watches closely for his future contributions.