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1 out of 1 Years Active: 2020-2024
Title: Joerg Frederik Blumrich: Innovator in Microlithography
Introduction
Joerg Frederik Blumrich is a notable inventor based in Jena, Germany. He has made significant contributions to the field of microlithography, holding three patents that showcase his innovative approach to technology.
Latest Patents
One of his latest patents is an "Apparatus and method for characterizing a microlithographic mask." This invention involves an apparatus that includes at least one light source emitting coherent light, an illumination optical unit that produces a diffraction-limited light spot on the mask, and a scanning device for implementing a scanning movement of the light spot relative to the mask. Additionally, it features a sensor unit and an evaluation unit for analyzing the light incident on the sensor. Another significant patent is the "Method for removing a particle from a mask system." This method outlines steps for detecting a particle in the mask system, providing laser radiation, and removing the particle by irradiating it with laser radiation that corresponds to the wavelength used by the projection exposure apparatus.
Career Highlights
Throughout his career, Joerg Frederik Blumrich has worked with prominent companies such as Carl Zeiss SMT GmbH and Carl Zeiss SMS Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas in microlithography.
Collaborations
He has collaborated with notable coworkers, including Shao-Chi Wei and Johannes Ruoff, contributing to advancements in their respective fields.
Conclusion
Joerg Frederik Blumrich's work in microlithography and his innovative patents highlight his significant impact on the industry. His contributions continue to influence the development of advanced technologies in this field.