The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2024
Filed:
Jun. 11, 2021
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Johannes Ruoff, Aalen, DE;
Heiko Feldmann, Aalen, DE;
Ulrich Matejka, Jena, DE;
Thomas Thaler, Jena, DE;
Sascha Perlitz, Jena, DE;
Shao-Chi Wei, Weimar, DE;
Joerg Frederik Blumrich, Jena, DE;
Markus Deguenther, Florstadt, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
The invention relates to an apparatus and a method for characterizing a microlithographic mask. According to one aspect, an apparatus according to the invention comprises at least one light source which emits coherent light, an illumination optical unit which produces a diffraction-limited light spot on the mask from the coherent light of the at least one light source, a scanning device, by use of which it is possible to implement a scanning movement of the diffraction-limited light spot relative to the mask, a sensor unit, and an evaluation unit for evaluating the light that is incident on the sensor unit and has come from the mask, an output coupling element for coupling out a portion of the coherent light emitted by the at least one light source, and an intensity sensor for capturing the intensity of this output coupled portion.