Company Filing History:
5 out of 1,410 
2 out of 83 Years Active: 2015-2024
Title: Sascha Perlitz: Innovator in Microlithography
Introduction
Sascha Perlitz is a notable inventor based in Jena, Germany, recognized for his contributions to the field of microlithography. With a total of six patents to his name, Perlitz has made significant advancements in the characterization and measurement of lithography masks.
Latest Patents
Among his latest patents, Perlitz has developed an "Apparatus and method for characterizing a microlithographic mask." This invention includes a sophisticated apparatus featuring a coherent light source, an illumination optical unit, a scanning device, a sensor unit, and an evaluation unit. The apparatus is designed to produce a diffraction-limited light spot on the mask and evaluate the light incident on the sensor unit. Another significant patent is the "Method for three-dimensionally measuring a 3D aerial image of a lithography mask." This method allows for the three-dimensional measurement of a 3D aerial image by reconstructing the electromagnetic wavefront of imaging light after its interaction with the lithography mask.
Career Highlights
Sascha Perlitz has worked with prominent companies in the industry, including Carl Zeiss SMT GmbH and Carl Zeiss SMS Ltd. His experience in these organizations has contributed to his expertise in microlithography and related technologies.
Collaborations
Throughout his career, Perlitz has collaborated with notable colleagues such as Ulrich Matejka and Johannes Ruoff. These collaborations have likely enriched his work and led to innovative solutions in the field.
Conclusion
Sascha Perlitz stands out as a significant figure in the realm of microlithography, with a strong portfolio of patents and a career marked by collaboration and innovation. His work continues to influence advancements in the industry.