The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2017
Filed:
Nov. 09, 2015
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventor:
Sascha Perlitz, Jena, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/04 (2006.01); G03F 1/84 (2012.01); G03F 7/20 (2006.01); G01N 21/956 (2006.01);
U.S. Cl.
CPC ...
G01B 11/046 (2013.01); G01N 21/956 (2013.01); G03F 1/84 (2013.01); G03F 7/70483 (2013.01);
Abstract
A method is provided for characterizing a mask having a structure, comprising the steps of: illuminating said mask under at least one illumination angle with monochromatic illuminating radiation, so as to produce a diffraction pattern of said structure that includes at least two maxima of adjacent diffraction orders, capturing said diffraction pattern, determining the intensities of the maxima of the adjacent diffraction orders, and determining an intensity quotient of the intensities. A mask inspection microscope for characterizing a mask in conjunction with the performance of the inventive method is also provided.