Jena, Germany

Ulrich Matejka

This inventor holds 24 USPTO granted patents and 13 published patent applications and 3 EPO patents, primarily in Microlithography Metrology. Top assignees: Carl Zeiss Smt Gmbh, Carl Zeiss Sms Ltd., Carl Zeiss Ag. Active years: 2013-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ulrich Matejka. Retrieved from https://idiyas.com/inventor/ulrich-matejka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 24 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.2

ph-index = 3

Forward Citations = 26(Granted Patents)


Company Filing History:


Years Active: 2013-2026

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Areas of Expertise:
Microlithography
Metrology
Mask Characterization
Optical Systems
Substrate Measurement
Scanning Probe Microscope
Aerial Image Simulation
Mask Inspection
24 patents (USPTO):Explore Patents

Title: The Innovative Journey of Ulrich Matejka

Introduction: Ulrich Matejka, a distinguished inventor hailing from Jena, Germany, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Ulrich Matejka's latest patents include advancements in renewable energy technologies, smart home devices, and medical equipment, showcasing his versatility and forward-thinking approach.

Career Highlights: With a career spanning over two decades, Ulrich Matejka has established himself as a pioneer in the tech industry, holding numerous patents and receiving recognition for his inventive solutions to complex problems.

Collaborations: Throughout his career, Ulrich Matejka has collaborated with leading research institutions, universities, and tech companies to bring his ideas to life, fostering a culture of innovation and excellence in the industry.

Conclusion: Ulrich Matejka's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors, leaving a lasting impact on the world of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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