The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2020
Filed:
Jan. 20, 2017
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Johannes Ruoff, Aalen, DE;
Ralf Müller, Aalen, DE;
Susanne Beder, Aalen, DE;
Ulrich Matejka, Jena, DE;
Hans-Jürgen Mann, Oberkochen, DE;
Jens Timo Neumann, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An imaging optical unit serves within a metrology system for examining a lithography mask. The lithography mask can be arranged in an object field of the imaging optical unit. The object field is defined by two mutually perpendicular object field coordinates. The imaging optical unit has an aperture stop of which the aspect ratio in the direction of the two object field coordinates differs from 1. This results in an imaging optical unit which can be used for the examination of lithography masks that are designed for projection exposure with an anamorphic projection optical unit.