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Hans-Jürgen Mann

This inventor holds 24 USPTO granted patents and 16 EPO patents, primarily in EUV Lithography. Top assignees: Carl-Zeiss-Smt Ag, Carl Zeiss Smt Gmbh. Active years: 2005-2020.

USPTO Granted Patents = 24

% Patents Active = 45.8

EPO Patents = 16 (Patent Applications = 24)

Average Co-Inventor Count = 3.0

ph-index = 10

Forward Citations = 317(Granted Patents)

Company Filing History:

Years Active: 2005-2020

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Areas of Expertise:

EUV Lithography

Projection Systems

Optical Elements

Metrology Techniques

Microlithography

Distortion Correction

Reflective X-ray Microscopes

Aerial Image Measurement

Catoptric Objectives

Semiconductor Components

Illumination Optics

Masks

24 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10634886 - Method for three-dimensionally measuring a 3D aerial image of a lithography mask (2020-04-28),

2. 10606048 - Imaging optical unit for a metrology system for examining a lithography mask (2020-03-31),

3. 10068325 - Method for three-dimensionally measuring a 3D aerial image of a lithography mask (2018-09-04),

4. 9110225 - Illumination optics for a metrology system for examining an object using EUV illumination light and metrology system comprising an illumination optics of this type (2015-08-18),

5. 8854606 - Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system (2014-10-07),

6. 8537460 - Reflective optical element and EUV lithography appliance (2013-09-17),

7. 7952797 - Reflective optical element and EUV lithography appliance (2011-05-31),

8. 7682031 - Catoptric objectives and systems using catoptric objectives (2010-03-23),

9. 7623620 - Reflective X-ray microscope and inspection system for examining objects with wavelengths <100 nm (2009-11-24),

10. 7605905 - Method for distortion correction in a microlithographic projection exposure apparatus (2009-10-20),

11. 7576934 - Groupwise corrected objective (2009-08-18),

12. 7572556 - Masks, lithography device and semiconductor component (2009-08-11),

13. 7375798 - Projection system for EUV lithography (2008-05-20),

14. 7372539 - Method for distortion correction in a microlithographic projection exposure apparatus (2008-05-13),

15. 7355678 - Projection system for EUV lithography (2008-04-08),

Title: The Innovative Journey of Hans-Jürgen Mann

Introduction:

Hans-Jürgen Mann, a visionary inventor hailing from Oberkochen, Germany, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents:

Hans-Jürgen Mann's latest patents include cutting-edge advancements in optical technology, precision engineering, and digital imaging, showcasing his commitment to pushing the boundaries of what is possible in the industry.

Career Highlights:

Throughout his illustrious career, Hans-Jürgen Mann has held key positions in renowned tech companies, where he spearheaded research and development projects that have revolutionized the way we interact with technology on a daily basis. His keen eye for detail and passion for innovation have earned him a reputation as a trailblazer in the field.

Collaborations:

Hans-Jürgen Mann has collaborated with leading experts in the industry, academic institutions, and research centers to bring his ideas to life. His ability to work seamlessly in interdisciplinary teams has led to the successful implementation of cutting-edge technologies in various sectors.

Conclusion:

In conclusion, Hans-Jürgen Mann's relentless pursuit of innovation and his unwavering dedication to pushing the boundaries of technology have solidified his position as a pioneering inventor in the industry. His contributions continue to inspire future generations of inventors to dream big and think outside the box.

Profile summary based on public USPTO records.

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