The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 2009

Filed:

Jan. 23, 2007
Applicants:

Michael Schottner, Leimen, DE;

Hans-jurgen Mann, Oberkochen, DE;

Martin Lowisch, Oberkochen, DE;

Inventors:

Michael Schottner, Leimen, DE;

Hans-Jurgen Mann, Oberkochen, DE;

Martin Lowisch, Oberkochen, DE;

Assignee:

Carl Zeiss SMT AG, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An objective and method of fabricating an objective, particularly a projection objective for microlithography, comprising a plurality of optical elements. In one example, the method comprises acts of determining groups of optically similar optical elements or surfaces having at least two members, determining wave front deformations by the optical elements or surfaces, determining the necessary corrections for the optical elements or surfaces of a group, and performing the corrections for a group at a group member.


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