Company Filing History:
8 out of 83 
8 out of 1,410 
2 out of 9 Years Active: 2007-2023
Title: The Innovative Contributions of Thorsten Hofmann
Introduction
Thorsten Hofmann is a notable inventor based in Rodgau, Germany. He has made significant contributions to the field of photolithography, particularly through his innovative patents. With a total of 17 patents to his name, Hofmann has established himself as a key figure in the development of advanced technologies.
Latest Patents
Hofmann's latest patents include a device and method for analyzing defects in photolithographic masks or wafers. This invention involves a scanning probe microscope that features a probe arrangement designed to analyze defects. The microscope includes at least one first probe for defect analysis, means for producing marks to indicate defect positions, and a design that allows detection by a scanning particle beam microscope. This innovative approach enhances the accuracy and efficiency of defect analysis in photolithography.
Career Highlights
Throughout his career, Hofmann has worked with prominent companies in the industry, including Carl Zeiss SMS Ltd. and Carl Zeiss SMT GmbH. His experience in these organizations has contributed to his expertise and the development of his patented technologies.
Collaborations
Hofmann has collaborated with notable colleagues such as Klaus Edinger and Michael Budach. These partnerships have likely fostered an environment of innovation and creativity, leading to advancements in their respective fields.
Conclusion
Thorsten Hofmann's contributions to the field of photolithography through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry, showcasing the importance of innovation in technology.