The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2017
Filed:
May. 09, 2011
Applicants:
Tristan Bret, Darmstadt, DE;
Petra Spies, Mainz, DE;
Thorsten Hofmann, Rodgau, DE;
Inventors:
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/304 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); G03F 1/74 (2012.01); H01J 37/305 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3045 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); G03F 1/74 (2013.01); H01J 37/3056 (2013.01); H01J 2237/31737 (2013.01); H01J 2237/31744 (2013.01);
Abstract
The invention relates to a method for processing a substrate with a focussed particle beam which incidents on the substrate, the method comprising the steps of: (a) generating at least one reference mark on the substrate using the focused particle beam and at least one processing gas, (b) determining a reference position of the at least one reference mark, (c) processing the substrate using the reference position of the reference mark, and (d) removing the at least one reference mark from the substrate.