The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2014
Filed:
Aug. 11, 2009
Applicants:
Nicole Auth, Gustavsburg, DE;
Petra Spies, Mainz, DE;
Rainer Becker, Pfungstadt, DE;
Thorsten Hofmann, Rodgau, DE;
Klaus Edinger, Lorsch, DE;
Inventors:
Nicole Auth, Gustavsburg, DE;
Petra Spies, Mainz, DE;
Rainer Becker, Pfungstadt, DE;
Thorsten Hofmann, Rodgau, DE;
Klaus Edinger, Lorsch, DE;
Assignee:
Carl Zeiss SMS GmbH, Jena, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention relates to a method for electron beam induced etching of a layer contaminated with gallium, with the method steps of providing at least one first halogenated compound as an etching gas at the position at which an electron beam impacts on the layer, and providing at least one second halogenated compound as a precursor gas for removing of the gallium from this position.