The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 06, 2018

Filed:

May. 19, 2016
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Michael Budach, Hanau, DE;

Thorsten Hofmann, Rodgau, DE;

Klaus Edinger, Lorsch, DE;

Pawel Szych, Munich, DE;

Gabriel Baralia, Dieburg, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01Q 30/02 (2010.01); G01Q 30/06 (2010.01); G01B 11/14 (2006.01); G03F 1/84 (2012.01);
U.S. Cl.
CPC ...
G01Q 30/02 (2013.01); G01B 11/14 (2013.01); G01Q 30/06 (2013.01); G03F 1/84 (2013.01);
Abstract

The present invention relates to apparatuses and methods for examining a surface of a test object, such as e.g. a lithography mask. In accordance with one aspect of the invention, an apparatus for examining a surface of a mask comprises a probe which interacts with the surface of the mask, and a measuring apparatus for establishing a reference distance of the mask from a reference point, wherein the measuring apparatus measures the reference distance of the mask in a measurement region of the mask which is not arranged on the surface of the mask.


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