The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 21, 2012

Filed:

May. 27, 2010
Applicants:

Klaus Edinger, Lorsch, DE;

Rainer Becker, Pfungstadt, DE;

Michael Budach, Hanau, DE;

Thorsten Hofmann, Rodgau, DE;

Inventors:

Klaus Edinger, Lorsch, DE;

Rainer Becker, Pfungstadt, DE;

Michael Budach, Hanau, DE;

Thorsten Hofmann, Rodgau, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/22 (2006.01); G21K 5/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus and a method for investigating and/or modifying a sample is disclosed. The apparatus comprises a charged particle source, at least one particle optical element forming a charged particle beam of charged particles emitted by said charged particle source. The apparatus further comprises an objective lens which generates a charged particle probe from said charged particle beam. The objective lens defines a particle optical axis. A first electrostatic deflection element is arranged—in a direction of propagation of charged particles emitted by said charged particle source—downstream of the objective lens. The electrostatic deflection element deflecting the charged particle beam in a direction perpendicular to said charged particle optical axis and has a deflection bandwidth of at least 10 MHz.


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