The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2018
Filed:
Dec. 20, 2013
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Michael Budach, Hanau, DE;
Tristan Bret, Darmstadt, DE;
Klaus Edinger, Lorsch, DE;
Thorsten Hofmann, Rodgau, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01Q 30/02 (2010.01); G03F 1/22 (2012.01); G03F 1/84 (2012.01); G03F 1/86 (2012.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
G01Q 30/02 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); G03F 1/22 (2013.01); G03F 1/84 (2013.01); G03F 1/86 (2013.01);
Abstract
The invention refers to a method for analyzing a defect of an optical element for the extreme ultra-violet wavelength range comprising at least one substrate and at least one multi-layer structure, the method comprising the steps: (a) determining first data by exposing the defect to ultra-violet radiation, (b) determining second data by scanning the defect with a scanning probe microscope, (c) determining third data by scanning the defect with a scanning particle microscope, and (d) com-bining the first, the second and the third data.