The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 2017
Filed:
Jul. 11, 2011
Applicant:
Vladimir Dmitriev, Karmiel, IL;
Inventor:
Vladimir Dmitriev, Karmiel, IL;
Assignee:
Carl Zeiss SMS Ltd., Karmiel, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/72 (2012.01); G06F 17/50 (2006.01); G03F 1/84 (2012.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 1/72 (2013.01); G03F 1/84 (2013.01); G03F 7/70466 (2013.01); G03F 7/70625 (2013.01);
Abstract
A method for correcting a plurality of errors of a photolithographic mask is provided. First parameters of a imaging transformation of the photolithographic mask and second parameters of a laser beam locally directed onto the photolithographic mask are optimized, and the plurality of errors are corrected by applying an imaging transformation using optimized first parameters and locally directing the laser beam onto the photolithographic mask using optimized second parameters. The first and the second parameters are simultaneously optimized in a joint optimization process.