The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2008
Filed:
Dec. 12, 2002
Eitan Zait, Kibbutz Hanita, IL;
Vladimir J. Dmitriev, Karmiel, IL;
Sergey V Oshemkov, Karmiel, IL;
Nikolay N. Guletskiy, Karmiel, IL;
Guy Ben-zvi, Har Halutz, IL;
Eitan Zait, Kibbutz Hanita, IL;
Vladimir J. Dmitriev, Karmiel, IL;
Sergey V Oshemkov, Karmiel, IL;
Nikolay N. Guletskiy, Karmiel, IL;
Guy Ben-Zvi, Har Halutz, IL;
Pixer Technology Ltd., Karmiel, IL;
Abstract
A system and method for repairing a photomask () for use in a photolithography process is disclosed, the photomask (), consisting of a substrate layer () and a chrome layer () over the substrate layer (), having a defect () in the chrome layer (), the method comprising: providing a pulsed laser source () for generating an ultra-short pulsed laser beam; providing optical elements for scanning, directing and focusing the pulsed laser beam at a desired target location; directing the pulsed laser beam through the substrate and focusing it on a target location located inside the substrate adjacent the defect () to write a diffractive optical element (), thus changing the scattering properties of the substrate at the target location.