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For the Inventor, By the Inventor

Billerica, MA, United States of America

Tel Epion Corporation


USPTO Granted Patents = 84


Trademarks = 1

Forward Citations = 589

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55 inventors (with patents filed for the assignee):

goldMedal John J Hautala (33 out of 99 patents)

silverMedal Noel Russell (22 out of 24 patents)

bronzeMedal Martin D Tabat (15 out of 17 patents)

4.  Matthew C Gwinn (13 out of 23 patents)

5.  Michael A Graf (10 out of 30 patents)

6.  Yan Shao (9 out of 9 patents)

7.  Robert K Becker (8 out of 10 patents)

8.  Avrum Freytsis (8 out of 9 patents)

9.  Joshua LaRose (7 out of 8 patents)

10.  Steven P Caliendo (7 out of 12 patents)

11.  Christopher K Olsen (7 out of 9 patents)

12.  Kenneth P Regan (7 out of 8 patents)

13.  Ruairidh Maccrimmon (6 out of 6 patents)

14.  Steven Robert Sherman (6 out of 21 patents)

15.  Luis Fernandez (5 out of 6 patents)


Core Competencies:
Gas Cluster Ion Beam
Substrate Edge Profile Correction
Beam Deflection
Thin Film Growth
Surface Profile Adjustment
Etch Rate Modification
Silicide Property Alteration
High Throughput Processing
Multi-Pass Correction
Directional Deposition
Low Contamination Scanning
Molecular Beam Enhancement

84 patents:

1. 10971411 - Hybrid corrective processing system and method (2021-04-06),
2. 10861674 - Compensated location specific processing apparatus and method (2020-12-08),
3. 10497540 - Compensated location specific processing apparatus and method (2019-12-03),
4. 10256095 - Method for high throughput using beam scan size and beam position in gas cluster ion beam processing system (2019-04-09),
5. 10096527 - Hybrid corrective processing system and method (2018-10-09),
6. 9875947 - Method of surface profile correction using gas cluster ion beam (2018-01-23),
7. 9735019 - Process gas enhancement for beam treatment of a substrate (2017-08-15),
8. 9540725 - Method and apparatus for beam deflection in a gas cluster ion beam system (2017-01-10),
9. 9502209 - Multi-step location specific process for substrate edge profile correction for GCIB system (2016-11-22),
10. 9500946 - Sidewall spacer patterning method using gas cluster ion beam (2016-11-22),
11. 9355864 - Method for increasing adhesion of copper to polymeric surfaces (2016-05-31),
12. 9343259 - GCIB nozzle assembly (2016-05-17),
13. 9324567 - Gas cluster ion beam etching process for etching Si-containing, Ge-containing, and metal-containing materials (2016-04-26),
14. 9305746 - Pre-aligned nozzle/skimmer (2016-04-05),
15. 9236221 - Molecular beam enhanced GCIB treatment (2016-01-12),
Tel Epion Corporation is a technology company that specializes in telecommunications solutions and software development. They provide innovative solutions and services to help businesses effectively manage their communication networks, improve efficiency, and enhance customer experience. With a team of experienced professionals, Tel Epion Corporation aims to deliver cutting-edge solutions that empower businesses to stay competitive in today's fast-paced digital world.
This text is generated by artificial intelligence and may not be accurate.

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USPTO Data Jan 1 1976 - Dec 30 2025

84 Patents

#10 in Billerica, MA

#233 in Massachusetts

#4,273 in US

#8,762 in the World

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Billerica, MA, United States of America

Tel Epion Corporation

Forward Citations = 589

55 inventors:

goldMedal John J Hautala (33 out of 99 patents)

silverMedal Noel Russell (22 out of 24 patents)

bronzeMedal Martin D Tabat (15 out of 17 patents)

4.  Matthew C Gwinn (13 out of 23 patents)

5.  Michael A Graf (10 out of 30 patents)

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