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Billerica, MA, United States of America

Tel Epion Corporation

USPTO Granted Patents = 84

% Expired Patents = 25.0

EPO Patents = 2

Trademarks = 1

Forward Citations = 597

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55 inventors (with patents filed for the assignee):

John J Hautala (33 out of 102 patents)

Noel Russell (22 out of 24 patents)

Martin D Tabat (15 out of 17 patents)

4. Matthew C Gwinn (13 out of 26 patents)

5. Michael A Graf (10 out of 30 patents)

6. Yan Shao (9 out of 9 patents)

7. Robert K Becker (8 out of 10 patents)

8. Avrum Freytsis (8 out of 9 patents)

9. Joshua LaRose (7 out of 9 patents)

10. Steven P Caliendo (7 out of 12 patents)

11. Christopher K Olsen (7 out of 9 patents)

12. Kenneth P Regan (7 out of 8 patents)

13. Ruairidh Maccrimmon (6 out of 6 patents)

14. Steven Robert Sherman (6 out of 21 patents)

15. Luis Fernandez (5 out of 6 patents)

Core Competencies:

Beam Deflection

Surface Profile Correction

Substrate Processing

Etching Process

Thin Film Growth

Electromigration

Doped Regions

Material Infusion

High Throughput

Systematic Error Correction

Copper Interconnects

Patterning Method

84 patents: Sort by Forward Citations

1. 10971411 - Hybrid corrective processing system and method (2021-04-06),

2. 10861674 - Compensated location specific processing apparatus and method (2020-12-08),

3. 10497540 - Compensated location specific processing apparatus and method (2019-12-03),

4. 10256095 - Method for high throughput using beam scan size and beam position in gas cluster ion beam processing system (2019-04-09),

5. 10096527 - Hybrid corrective processing system and method (2018-10-09),

6. 9875947 - Method of surface profile correction using gas cluster ion beam (2018-01-23),

7. 9735019 - Process gas enhancement for beam treatment of a substrate (2017-08-15),

8. 9540725 - Method and apparatus for beam deflection in a gas cluster ion beam system (2017-01-10),

9. 9502209 - Multi-step location specific process for substrate edge profile correction for GCIB system (2016-11-22),

10. 9500946 - Sidewall spacer patterning method using gas cluster ion beam (2016-11-22),

11. 9355864 - Method for increasing adhesion of copper to polymeric surfaces (2016-05-31),

12. 9343259 - GCIB nozzle assembly (2016-05-17),

13. 9324567 - Gas cluster ion beam etching process for etching Si-containing, Ge-containing, and metal-containing materials (2016-04-26),

14. 9305746 - Pre-aligned nozzle/skimmer (2016-04-05),

15. 9236221 - Molecular beam enhanced GCIB treatment (2016-01-12),

Tel Epion Corporation, based in Billerica, MA, specializes in advanced gas cluster ion beam technology. The company focuses on innovative solutions for beam deflection, surface profile correction, and substrate processing. Their expertise extends to etching processes, thin film growth, and material infusion, addressing critical challenges in semiconductor manufacturing and materials science. Tel Epion's technologies are designed to enhance performance and reliability in various applications, contributing to advancements in the field of microelectronics.

Profile summary based on public USPTO records.

Company Badge

USPTO Data Jan 1 1976 - Sep 29 2026

84 Patents

#11 in Billerica, MA

#239 in Massachusetts

#4,423 in US

#9,044 in the World

Billerica, MA, United States of America

Tel Epion Corporation

Forward Citations = 597

55 inventors:

John J Hautala (33 out of 102 patents)

Noel Russell (22 out of 24 patents)

Martin D Tabat (15 out of 17 patents)

4. Matthew C Gwinn (13 out of 26 patents)

5. Michael A Graf (10 out of 30 patents)

Please report any incorrect information to [email protected]

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