Christopher K Olsen

Title: Christopher K Olsen: Innovator in Gas Cluster Ion Beam Technology

Introduction

Christopher K Olsen, a prominent inventor based in Peabody, Massachusetts, has made significant contributions to the field of gas cluster ion beam technology. With a total of nine patents to his name, Olsen has demonstrated a commitment to advancing innovations that enhance substrate processing capabilities.

Latest Patents

His latest patents showcase innovative methods for controlling and improving gas cluster ion beam systems. One such patent is for a "Method and Apparatus for Beam Deflection in a Gas Cluster Ion Beam System," which outlines a sophisticated control process involving deflection plates that direct a gas cluster ion beam (GCIB) towards a substrate. This system integrates a substrate scanning device, allowing for precise three-dimensional movements of substrates during processing. The controller plays a critical role by managing various deflection operating parameters such as deflection angle, voltage differentials, beam current, and gas flow rates, ensuring optimal performance during the substrate processing.

Another notable patent is for a "Gas Cluster Ion Beam Etching Process for Etching Si-containing, Ge-containing, and Metal-containing Materials." This patent describes a method and system that enhances GCIB etch processing for a variety of materials. By adjusting specific GCIB properties, the technology enables effective etching of Si-containing and Ge-containing materials, broadening the applicability of this innovative processing technique.

Career Highlights

Throughout his career, Christopher K Olsen has worked with notable companies, including Tel Epion Corporation. His extensive experience in this field positions him as a leading figure in developing advanced technologies for substrate processing and materials etching.

Collaborations

Olsen has collaborated with respected professionals in the industry, including Yan Shao and Martin D. Tabat. These partnerships have played an essential role in refining his inventions and pushing the boundaries of gas cluster ion beam technology.

Conclusion

In summary, Christopher K Olsen stands out as an inventor with a wealth of knowledge and innovation in gas cluster ion beam technology. His nine patents reflect a dedication to improving processes that serve industries reliant on precise substrate manipulation and etching techniques. As the field evolves, Olsen's contributions continue to pave the way for future advancements in this critical technological domain.