Winchendon, MA, United States of America

Matthew C Gwinn

This inventor holds 26 USPTO granted patents and 2 published patent applications and 1 EPO patent, primarily in Gas Cluster Ion Beam. Top assignees: Tel Epion Corporation, Tel Manufacturing and Engineering of America, Inc., Epion Corporation. Active years: 2002-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Matthew C Gwinn. Retrieved from https://idiyas.com/inventor/matthew-c-gwinn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 26 

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.8

ph-index = 6

Forward Citations = 189(Granted Patents)


Location History:

  • Salem, MA (US) (2002 - 2004)
  • Billerica, MA (US) (2023)
  • Winchendon, MA (US) (2006 - 2024)

Company Filing History:


Years Active: 2002-2026

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Areas of Expertise:
Multi-Wafer Handling
Automated Fault Detection
Substrate Scanning
Focused Beam Processing
Gas Cluster Ion Beam
Pattern Enhancement
Contamination Reduction
Irradiation Method
Beam Stability
Diagnostics
Nozzle Assembly
Ion Beam Processing
26 patents (USPTO):Explore Patents

Title: Matthew C Gwinn: Innovator and Patent Holder

Introduction:

Matthew C Gwinn, a talented inventor based in Winchendon, MA, has made significant contributions to the field of gas cluster ion beam systems. With 21 patents to his name, Gwinn's innovative methods and techniques have paved the way for advancements in substrate processing and pattern enhancement. Let us delve deeper into his latest patents, career highlights, and collaborations.

Latest Patents:

Gwinn's recent patents showcase his expertise in tuning gas cluster ion beam systems and pattern enhancement. His inventive approaches enable more precise and efficient substrate processing, improving overall performance and quality. These patents include:

1. Tuning Gas Cluster Ion Beam Systems: This method involves applying a drive pulse train to an ion source to ionize a gas cluster beam and measure its properties. By obtaining time-of-flight information, Gwinn determines size information that contributes to adjusting the process parameters to enhance the gas cluster beam's performance.

2. Pattern Enhancement Using a Gas Cluster Ion Beam: In this patent, Gwinn outlines a method to modify the widths of features on a substrate's major surface. By etching the sidewalls of the feature with a gas cluster ion beam, Gwinn achieves the desired pattern changes with precision.

Career Highlights:

During his career, Matthew C Gwinn has made significant contributions to various companies operating in the innovation and technology sectors. Some of his notable career highlights include his association with Tel Epion Corporation and Epion Corporation. These organizations have been at the forefront of developing cutting-edge technologies related to semiconductor fabrication and materials research.

Collaborations:

Gwinn's commitment to innovation is also evident through his collaborations with talented individuals in the field. Notably, he has collaborated with Martin D Tabat and Avrum Freytsis, further amplifying their collective impact on the industry. These collaborations fostered an environment of knowledge exchange, pushing the boundaries of gas cluster ion beam research.

Conclusion:

Matthew C Gwinn's distinct contributions and impressive patent portfolio reflect his expertise and commitment to advancing gas cluster ion beam systems. Through his innovative approaches, he has significantly improved substrate processing and pattern enhancement methodologies. Gwinn's collaboration with fellow professionals and his associations with renowned companies further underline his dedication to innovation and invention. As an inventor, he continues to be a driving force in the field, paving the way for future breakthroughs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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