The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2015

Filed:

Jul. 28, 2014
Applicant:

Tel Epion Inc., Billerica, MA (US);

Inventors:

Matthew C. Gwinn, Winchendon, MA (US);

Avrum Freytsis, Salem, MA (US);

Jerry Negrotti, Beverly, MA (US);

Robert K. Becker, Danvers, MA (US);

Assignee:

TEL Epion Inc., Billerica, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); G21K 5/08 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); G21K 5/08 (2013.01); H01J 37/317 (2013.01); H01J 2237/20228 (2013.01); H01J 2237/20235 (2013.01); H01J 2237/20278 (2013.01);
Abstract

Disclosed are an apparatus, system, and method for scanning a substrate or other workpiece through a gas-cluster ion beam (GCIB), or any other type of ion beam. The workpiece scanning apparatus is configured to receive and hold a substrate for irradiation by the GCIB and to scan it through the GCIB in two directions using two movements: a reciprocating fast-scan movement, and a slow-scan movement. The slow-scan movement is actuated using a servo motor and a belt drive system, the belt drive system being configured to reduce the failure rate of the workpiece scanning apparatus. The apparatus further includes shields and other features for reducing process contamination resulting from scattering of the GCIB from the scanning apparatus.


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