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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11587760 B1

PDFFull Text
Date of Patent:
Feb. 21, 2023

Filed:

Oct. 14, 2020

Wafer scanning apparatus and method for focused beam processing

Applicant:

Tel Manufacturing and Engineering of America, Inc., Chaska, MN (US);

Inventors:

Matthew Gwinn, Winchendon, MA (US);

Paul Consoli, Ipswich, MA (US);

Jerry Negrotti, Beverly, MA (US);

Assignee:

TEL Manufacturing and Engineering of America, Inc., Chaska, MA (US);

Attorney:

Slater Matsil, LLP

Primary Examiner:

Nicole M Ippolito

Int. Cl.
CPC ...
H01J 37/20 (2006.01); H01J 37/31 (2006.01); C23C 14/46 (2006.01); C23C 14/50 (2006.01); H01L 21/68 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); C23C 14/46 (2013.01); C23C 14/505 (2013.01); H01J 37/317 (2013.01); H01L 21/68 (2013.01); H01J 2237/20228 (2013.01);
Abstract

A scanning system includes a scanning chamber; a first rotary drive disposed in the scanning chamber and configured to rotate around a first axis; a second rotary drive disposed in the scanning chamber and configured to rotate around the first axis synchronously with the first rotary drive; and a bar-and-hinge system disposed in the scanning chamber and mechanically coupled to a substrate holder, the hinge system configured to translate a rotary motion of the first rotary drive and the second rotary drive to a planar motion of the substrate holder.

Find Patent Forward Citations

Gwinn, Matthew. (2023). Wafer scanning apparatus and method for focused beam processing (U.S. Patent No. 11587760). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11587760

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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