The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2024

Filed:

Feb. 02, 2023
Applicant:

Tel Manufacturing and Engineering of America, Inc., Chaska, MN (US);

Inventors:

Matthew Gwinn, Winchendon, MA (US);

Paul Consoli, Ipswich, MA (US);

Jerry Negrotti, Beverly, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); C23C 14/46 (2006.01); C23C 14/50 (2006.01); H01J 37/31 (2006.01); H01J 37/317 (2006.01); H01L 21/68 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); C23C 14/46 (2013.01); C23C 14/505 (2013.01); H01J 37/317 (2013.01); H01L 21/68 (2013.01); H01J 2237/20228 (2013.01);
Abstract

A method of scanning a wafer includes placing the wafer over a substrate holder inside a processing chamber, where the wafer is placed at a first twist angle relative to a reference axis of a rotatable feedthrough of the processing chamber. The method further includes performing a first pass scan by exposing the wafer to an ion beam while driving two rotary drives disposed in a scanning chamber synchronously to generate a planar motion of the wafer from a rotational motion of the two rotary drives, where the wafer is oriented continuously at the first twist angle when performing the first pass scan.


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