Arlington, MA, United States of America

Ruairidh Maccrimmon

USPTO Granted Patents = 6 

Average Co-Inventor Count = 3.6

ph-index = 3

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2009-2013

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6 patents (USPTO):Explore Patents

Title: The Innovative Genius of Ruairidh Maccrimmon

Introduction

Ruairidh Maccrimmon is an accomplished inventor based in Arlington, MA, recognized for his groundbreaking contributions to the field of gas cluster ion beam technology. With a total of six patents to his name, Maccrimmon has carved out a significant niche in the innovation landscape, particularly in processes that involve metal-containing materials.

Latest Patents

Among Maccrimmon's latest inventions are two notable patents that showcase his expertise in gas cluster ion beam (GCIB) etching processes. The first patent describes a method and system for performing GCIB etch processing of metal-containing materials, emphasizing the formation of a GCIB that includes a halogen element. The second patent focuses on achieving target etch process metrics for a variety of materials by setting specific properties of the GCIB process, thus enhancing the efficiency and effectiveness of the etching techniques.

Career Highlights

Currently, Ruairidh Maccrimmon is working at Tel Epion Corporation, where he leverages his innovative mindset to advance the company's technological capabilities. His role as an inventor has allowed him to contribute significantly to the company's goals and objectives through his exceptional understanding of etching processes.

Collaborations

Maccrimmon collaborates with talented coworkers including Nicolaus J Hofmeester and Steven P Caliendo. Together, they form a dynamic team that pushes the boundaries of technology and innovation in their field.

Conclusion

In summary, Ruairidh Maccrimmon stands out as a pivotal figure in the world of innovation, especially within the specialized realm of gas cluster ion beam processes. His patents not only signify his individual achievements but also contribute to the larger landscape of technological advancement, showcasing how collaboration and expertise can lead to remarkable innovations.

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