The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2009
Filed:
Jun. 28, 2007
Nicolaus J. Hofmeester, Danvers, MA (US);
Steven P. Caliendo, Ashby, MA (US);
Thomas G. Tetreault, Manchester, NH (US);
Ruairidh Maccrimmon, Arlington, MA (US);
Nicolaus J. Hofmeester, Danvers, MA (US);
Steven P. Caliendo, Ashby, MA (US);
Thomas G. Tetreault, Manchester, NH (US);
Ruairidh MacCrimmon, Arlington, MA (US);
TEL Epion Inc., Billerica, MA (US);
Abstract
Embodiments of the invention describe methods and apparatus for assigning a beam intensity profile to a gas cluster ion beam and processing workpieces using a gas cluster ion beam. One embodiment includes generating a gas cluster ion beam in a gas cluster ion beam processing apparatus, collecting parametric data relating to the spatial intensity of the gas cluster ion beam, and generating a beam intensity profile describing the spatial intensity of the gas cluster ion beam by fitting a mathematical functional shape to the parametric data. Another embodiment describes a method for processing a workpiece using a gas cluster ion beam.