Company Filing History:
Years Active: 2009-2012
Title: Innovations by Nicolaus J Hofmeester
Introduction
Nicolaus J Hofmeester is a notable inventor based in Danvers, MA (US). He has made significant contributions to the field of substrate processing, holding a total of 4 patents. His work focuses on advanced methods and systems that enhance the precision and effectiveness of processing techniques.
Latest Patents
Hofmeester's latest patents include a "Method and system for adjusting beam dimension for high-gradient location specific processing." This patent describes a method that establishes a gas cluster ion beam (GCIB) based on specific beam properties. It involves measuring metrology data for a substrate and determining spatial gradients to adjust beam properties accordingly. The adjusted GCIB is then applied to the substrate based on computed correction data.
Another significant patent is the "Method and system for multi-pass correction of substrate defects." This invention outlines a process for acquiring metrology data and computing correction data to treat high gradient regions on a substrate. It details the establishment of a first GCIB for treatment and the optional acquisition of second metrology data for further adjustments.
Career Highlights
Hofmeester is currently employed at Tel Epion Corporation, where he continues to innovate in the field of substrate processing. His work has been instrumental in developing techniques that improve the quality and efficiency of processing methods.
Collaborations
Some of his notable coworkers include Steven P Caliendo and Ruairidh Maccrimmon, who contribute to the collaborative environment at Tel Epion Corporation.
Conclusion
Nicolaus J Hofmeester's contributions to substrate processing through his innovative patents demonstrate his expertise and commitment to advancing technology in this field. His work continues to influence the industry and pave the way for future innovations.