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Austin, TX, United States of America

Canon Nanotechnologies, Inc.

USPTO Granted Patents = 34

EPO Patents = 15

Forward Citations = 117

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45 inventors (with patents filed for the assignee):

Byung-Jin Choi (13 out of 141 patents)

Frank Y Xu (11 out of 123 patents)

Sidlgata V Sreenivasan (9 out of 143 patents)

4. Niyaz Khusnatdinov (6 out of 49 patents)

5. Kosta S Selinidis (6 out of 14 patents)

6. Mario Johannes Meissl (5 out of 53 patents)

7. Edward Brian Fletcher (5 out of 37 patents)

8. Gerard M Schmid (5 out of 80 patents)

9. Mahadevan GanapathiSubramanian (5 out of 7 patents)

10. Weijun Liu (4 out of 43 patents)

11. Michael Nevin Miller (4 out of 70 patents)

12. Douglas J Resnick (4 out of 15 patents)

13. Dwayne L LaBrake (4 out of 27 patents)

14. Anshuman Cherala (3 out of 42 patents)

15. Philip D Schumaker (3 out of 23 patents)

34 patents: Sort by Forward Citations

1. 11333969 - Imprint apparatus, imprint method, and article manufacturing method (2022-05-17),

2. 11199772 - Adjacent field alignment (2021-12-14),

3. 10578964 - Asymmetric template shape modulation for partial field imprinting (2020-03-03),

4. RE47483 - Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template (2019-07-01),

5. 10168615 - Imprint apparatus, imprint method, and article manufacturing method (2019-01-01),

6. 10124529 - Imprint lithography template and method for zero-gap imprinting (2018-11-13),

7. 9778578 - Low contact imprint lithography template chuck system for improved overlay correction (2017-10-03),

8. 9778562 - Porous template and imprinting stack for nano-imprint lithography (2017-10-03),

9. 9770850 - Imprint apparatus and article manufacturing method (2017-09-26),

10. 9651862 - Drop pattern generation for imprint lithography with directionally-patterned templates (2017-05-16),

11. 9616614 - Large area imprint lithography (2017-04-11),

12. 9529274 - Chucking system with recessed support feature (2016-12-27),

13. 9514950 - Methods for uniform imprint pattern transfer of sub-20 nm features (2016-12-06),

14. 9452574 - Fabrication of seamless large area master templates for imprint lithography using step and repeat tools (2016-09-27),

15. 9323143 - Controlling template surface composition in nano-imprint lithography (2016-04-26),

Canon Nanotechnologies, Inc. is a leading technology company specializing in the development and manufacturing of cutting-edge nanotechnology solutions. With a strong focus on research and innovation, the company leverages nanoscale science to create advanced materials and devices for diverse industries. Canon Nanotechnologies is committed to pushing the boundaries of what is possible in nanotechnology by delivering high-quality, scalable, and sustainable solutions to meet the evolving needs of customers worldwide.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 30 2025

34 Patents

#90 in Austin, TX

#545 in Texas

#9,680 in US

#19,060 in the World

Austin, TX, United States of America

Canon Nanotechnologies, Inc.

Forward Citations = 117

45 inventors:

Byung-Jin Choi (13 out of 141 patents)

Frank Y Xu (11 out of 123 patents)

Sidlgata V Sreenivasan (9 out of 143 patents)

4. Niyaz Khusnatdinov (6 out of 49 patents)

5. Kosta S Selinidis (6 out of 14 patents)

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