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Austin, TX, United States of America

Canon Nanotechnologies, Inc.

USPTO Granted Patents = 34

% Expired Patents = 5.9

EPO Patents = 15

Forward Citations = 124

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45 inventors (with patents filed for the assignee):

Byung-Jin Choi (13 out of 145 patents)

Frank Y Xu (11 out of 130 patents)

Sidlgata V Sreenivasan (9 out of 148 patents)

4. Niyaz Khusnatdinov (6 out of 51 patents)

5. Kosta S Selinidis (6 out of 14 patents)

6. Mario Johannes Meissl (5 out of 54 patents)

7. Edward Brian Fletcher (5 out of 37 patents)

8. Gerard M Schmid (5 out of 80 patents)

9. Mahadevan GanapathiSubramanian (5 out of 7 patents)

10. Weijun Liu (4 out of 46 patents)

11. Michael Nevin Miller (4 out of 73 patents)

12. Douglas J Resnick (4 out of 15 patents)

13. Dwayne L LaBrake (4 out of 28 patents)

14. Anshuman Cherala (3 out of 43 patents)

15. Philip D Schumaker (3 out of 23 patents)

Core Competencies:

Imprint Apparatus

Template Design

Pattern Transfer

Substrate Cleaning

Alignment Marks

Nano Imprinting

Chucking System

Partial Field Imprinting

High Throughput

Porous Template

Zero-Gap Imprinting

34 patents: Sort by Forward Citations

1. 11333969 - Imprint apparatus, imprint method, and article manufacturing method (2022-05-17),

2. 11199772 - Adjacent field alignment (2021-12-14),

3. 10578964 - Asymmetric template shape modulation for partial field imprinting (2020-03-03),

4. RE47483 - Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template (2019-07-01),

5. 10168615 - Imprint apparatus, imprint method, and article manufacturing method (2019-01-01),

6. 10124529 - Imprint lithography template and method for zero-gap imprinting (2018-11-13),

7. 9778578 - Low contact imprint lithography template chuck system for improved overlay correction (2017-10-03),

8. 9778562 - Porous template and imprinting stack for nano-imprint lithography (2017-10-03),

9. 9770850 - Imprint apparatus and article manufacturing method (2017-09-26),

10. 9651862 - Drop pattern generation for imprint lithography with directionally-patterned templates (2017-05-16),

11. 9616614 - Large area imprint lithography (2017-04-11),

12. 9529274 - Chucking system with recessed support feature (2016-12-27),

13. 9514950 - Methods for uniform imprint pattern transfer of sub-20 nm features (2016-12-06),

14. 9452574 - Fabrication of seamless large area master templates for imprint lithography using step and repeat tools (2016-09-27),

15. 9323143 - Controlling template surface composition in nano-imprint lithography (2016-04-26),

Company Overview

Canon Nanotechnologies, Inc. is a pioneering technology firm based in Austin, Texas, specializing in advanced nanotechnology solutions. The company focuses on the development and manufacturing of innovative materials and processes that leverage nanoscale phenomena to enhance performance across various applications. With a strong emphasis on research and development, Canon Nanotechnologies aims to drive advancements in fields such as electronics, energy, and healthcare, positioning itself at the forefront of the nanotechnology landscape.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 13 2026

34 Patents

#90 in Austin, TX

#543 in Texas

#10,014 in US

#19,631 in the World

Austin, TX, United States of America

Canon Nanotechnologies, Inc.

Forward Citations = 124

45 inventors:

Byung-Jin Choi (13 out of 145 patents)

Frank Y Xu (11 out of 130 patents)

Sidlgata V Sreenivasan (9 out of 148 patents)

4. Niyaz Khusnatdinov (6 out of 51 patents)

5. Kosta S Selinidis (6 out of 14 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Canon Nanotechnologies, Inc.. Retrieved from https://idiyas.com/company/canon-nanotechnologies

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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