The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2017

Filed:

Apr. 16, 2014
Applicants:

Canon Kabushiki Kaisha, Tokyo, JP;

Canon Nanotechnologies, Inc., Austin, TX (US);

Molecular Imprints, Inc., Austin, TX (US);

Inventors:

Makoto Mizuno, Utsunomiya, JP;

Tsuyoshi Arai, Utsunomiya, JP;

Yukio Takabayashi, Saitama, JP;

Steven C. Shackleton, Austin, TX (US);

Byung-Jin Choi, Austin, TX (US);

Assignees:

CANON KABUSHIKI KAISHA, Tokyo, JP;

CANON NANOTECHNOLOGIES, INC., Austin, TX (US);

MOLECULAR IMPRINTS, INC., Austin, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 43/20 (2006.01); B29C 43/02 (2006.01); G03F 7/00 (2006.01); B29K 101/00 (2006.01); B29L 31/34 (2006.01); B29L 11/00 (2006.01);
U.S. Cl.
CPC ...
B29C 43/203 (2013.01); B29C 43/021 (2013.01); G03F 7/0002 (2013.01); B29C 2043/025 (2013.01); B29K 2101/00 (2013.01); B29L 2011/00 (2013.01); B29L 2031/34 (2013.01);
Abstract

Provided is an imprint apparatus that imprints a pattern formed on a mold onto a substrate. The imprint apparatus includes a substrate holder that holds the substrate and can move in a direction along the surface of the substrate; a gas supply unit for supplying a gas into a space between a pattern part of the mold and the substrate; and a wall part that is disposed so as to enclose the space that is supplied with gas, wherein at a position opposed to the substrate and the mold, the wall part faces the substrate holder or the substrate with a gap therebetween.


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