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For the Inventor, By the Inventor

Saitama, Japan

Yukio Takabayashi

This inventor holds 25 USPTO granted patents and 2 published patent applications and 1 EPO patent, primarily in Exposure Apparatus. Top assignees: Canon Kabushiki Kaisha, Canon Nanotechnologies, Inc., Molecular Imprints, Inc.. Active years: 1993-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yukio Takabayashi. Retrieved from https://idiyas.com/inventor/yukio-takabayashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 25 

% Patents Active = 64.0

 

Average Co-Inventor Count = 2.1

ph-index = 10

Forward Citations = 456(Granted Patents)


Location History:

  • Kawasaki, JP (1993)
  • Utsunomiya, JP (1997 - 2003)
  • Oomiya, JP (2003 - 2004)
  • Saitama, JP (2005 - 2019)

Company Filing History:

goldMedal25 out of 92,994 
 
Canon Kabushiki Kaisha
 patents
silverMedal1 out of 34 
 
Canon Nanotechnologies, Inc.
 patents
bronzeMedal1 out of 231 
 
Molecular Imprints, Inc.
 patents
where one patent can have more than one assignee

Years Active: 1993-2019

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Areas of Expertise:
Imprint Apparatus
Substrate Holding Device
Exposure System
Device Manufacturing
Stage Mechanism
Vibration Suppression
Projection Exposure
Coating Apparatus
Substrate Transfer
Anti-Vibration
Retainer
Moving Mechanism
25 patents (USPTO):Explore Patents
1. 10331027 - Imprint apparatus, imprint system, and method of manufacturing article (2019-06-25),
2. 10112324 - Imprint method, imprint apparatus, and production method for article (2018-10-30),
3. 9952504 - Imprint method, imprint apparatus, and method for manufacturing device (2018-04-24),
4. 9770850 - Imprint apparatus and article manufacturing method (2017-09-26),
5. 9339970 - Imprint apparatus, and article manufacturing method (2016-05-17),
6. 8179518 - Exposure apparatus to correct position between reticle and substrate according to propagation time and shifting rate (2012-05-15),
7. 7425238 - Substrate holding device (2008-09-16),
8. 7352520 - Holding device and exposure apparatus using the same (2008-04-01),
9. 7346414 - Moving mechanism and stage system in exposure apparatus (2008-03-18),
10. 7253975 - Retainer, exposure apparatus, and device fabrication method (2007-08-07),
11. 7161750 - Retainer, exposure apparatus, and device fabrication method (2007-01-09),
12. 6990386 - Moving mechanism and stage system in exposure apparatus (2006-01-24),
13. 6965428 - Stage apparatus, exposure apparatus, and semiconductor device manufacturing method (2005-11-15),
14. 6809802 - Substrate attracting and holding system for use in exposure apparatus (2004-10-26),
15. 6762826 - Substrate attracting and holding system for use in exposure apparatus (2004-07-13),

Title: Yukio Takabayashi: Pioneering Inventor from Saitama

Introduction: Yukio Takabayashi is a renowned inventor hailing from Saitama, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Yukio Takabayashi holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his continuous commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Yukio Takabayashi has worked with leading tech companies in Japan, spearheading research and development projects that have led to significant technological breakthroughs.

Collaborations: Throughout his career, Yukio Takabayashi has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge exchange.

Conclusion: Yukio Takabayashi's relentless pursuit of innovation and his passion for creating technology that positively impacts society solidify his position as a pioneering inventor not only in Saitama but on a global scale.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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