The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2004
Filed:
Aug. 27, 2003
Applicant:
Inventors:
Izumi Tsukamoto, Tokyo, JP;
Itaru Fujita, Utsunomiya, JP;
Hideki Nogawa, Utsunomiya, JP;
Yukio Takabayashi, Oomiya, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/758 ; G03B 2/742 ; G03B 2/732 ; G01B 1/100 ;
U.S. Cl.
CPC ...
G03B 2/758 ; G03B 2/742 ; G03B 2/732 ; G01B 1/100 ;
Abstract
A substrate attracting and holding system includes a holding table for holding a substrate, a protrusion provided on the holding table, the protrusion being disposed to be placed in a predetermined positional relationship with a position of an alignment mark to be used for processing the substrate or a position with respect to which an alignment mark is to be produced.
Tsukamoto, Izumi. (2004). Substrate attracting and holding system for use in exposure apparatus (U.S. Patent No. 6762826). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6762826
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile