Itaru Fujita is a prominent inventor based in Utsunomiya, Japan. He has made significant contributions to the field of technology, particularly in the area of exposure methods and apparatuses. With a total of 5 patents to his name, Fujita's work has had a substantial impact on the industry.

Latest Patents

Fujita's latest patents include a stage control method, an exposure method, an exposure apparatus, and a device manufacturing method. The exposure method involves scanning a master plate with a pattern and a photosensitive substrate relative to a projection optical system. This method consists of several steps, including accelerating a stage to a predetermined velocity, transporting the stage while exposing the substrate, and stopping the stage after exposure. Additionally, he has developed a substrate attracting and holding system for use in exposure apparatuses. This method supports a substrate using a protrusion on a holding table and reduces pressure to attract and hold the substrate in place.

Career Highlights

Fujita is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and optical products. His work at Canon has allowed him to innovate and refine technologies that are essential for modern manufacturing processes.

Collaborations

Fujita has collaborated with notable coworkers, including Izumi Tsukamoto and Hideki Nogawa. Their combined expertise has contributed to the advancement of technologies in their field.

Conclusion

Itaru Fujita's innovative contributions and patents have significantly influenced the technology landscape. His work continues to inspire advancements in exposure methods and apparatuses, showcasing the importance of innovation in the industry.

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