The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2004
Filed:
Mar. 07, 2000
Applicant:
Inventor:
Itaru Fujita, Utsunomiya, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/742 ; G03B 2/732 ; G03B 1/933 ;
U.S. Cl.
CPC ...
G03B 2/742 ; G03B 2/732 ; G03B 1/933 ;
Abstract
An exposure method for scanning a master plate having a pattern and a photosensitive substrate relative to a projection optical system for projecting the pattern onto the substrate. The method includes a first step of accelerating a stage to a predetermined velocity, the stage holding the master plate or the substrate, a second step of transporting the stage at the predetermined velocity and exposing the substrate to the pattern during travel of the stage in a scanning direction, a third step of stopping the stage traveling at the predetermined velocity, and an acceleration step of accelerating the stage between the second step and the third step.