Utsunomiya, Japan

Hideki Nogawa

This inventor holds 12 USPTO granted patents. Top assignee: Canon Kabushiki Kaisha. Active years: 1990-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideki Nogawa. Retrieved from https://idiyas.com/inventor/hideki-nogawa-12k4vb73

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 2.6

ph-index = 10

Forward Citations = 312(Granted Patents)


Location History:

  • Tokyo, JP (1990)
  • Ohizumimachi, JP (1990)
  • Tochigi, JP (2003 - 2004)
  • Utsunomiya, JP (1999 - 2010)

Company Filing History:


Years Active: 1990-2010

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12 patents (USPTO):Explore Patents

Title: Innovations by Hideki Nogawa

Introduction

Hideki Nogawa is a prominent inventor based in Utsunomiya, Japan. He has made significant contributions to the field of exposure apparatus technology, holding a total of 12 patents. His work has been instrumental in advancing the capabilities of optical systems used in various applications.

Latest Patents

One of his latest patents is an exposure apparatus designed to expose multiple shot areas on a substrate to light through a liquid. This apparatus features a movable stage with a chuck that holds the substrate and a plate surrounding the chuck. It includes a projection optical system that projects light through an original onto the substrate. The apparatus is equipped with a first liquid supply nozzle positioned along the periphery of the final optical element and several second liquid supply nozzles on the stage. This innovative design allows for the efficient supply of liquid to the gap between the final optical element and the substrate, selecting the appropriate nozzle based on the exposure shot area's location.

Another notable patent is a substrate attracting and holding system for use in exposure apparatus. This method involves supporting a substrate using a protrusion on a holding table and reducing pressure between the holding table and the substrate to attract and hold it. The protrusion is strategically placed in relation to an alignment mark used for processing the substrate, ensuring precision in the manufacturing process.

Career Highlights

Hideki Nogawa is currently employed at Canon Kabushiki Kaisha, where he continues to innovate and develop advanced technologies. His work has significantly impacted the field of optical systems, enhancing the efficiency and effectiveness of exposure apparatus.

Collaborations

Throughout his career, Nogawa has collaborated with notable colleagues, including Izumi Tsukamoto and Itaru Fujita. These collaborations have fostered a creative environment that has led to groundbreaking advancements in their respective fields.

Conclusion

Hideki Nogawa's contributions to the field of exposure apparatus technology are noteworthy. His innovative patents and collaborations have positioned him as a leading inventor in the industry. His work continues to influence advancements in optical systems, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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