Location History:
- Tokyo, JP (1990)
- Ohizumimachi, JP (1990)
- Tochigi, JP (2003 - 2004)
- Utsunomiya, JP (1999 - 2010)
Company Filing History:
Years Active: 1990-2010
Title: Innovations by Hideki Nogawa
Introduction
Hideki Nogawa is a prominent inventor based in Utsunomiya, Japan. He has made significant contributions to the field of exposure apparatus technology, holding a total of 12 patents. His work has been instrumental in advancing the capabilities of optical systems used in various applications.
Latest Patents
One of his latest patents is an exposure apparatus designed to expose multiple shot areas on a substrate to light through a liquid. This apparatus features a movable stage with a chuck that holds the substrate and a plate surrounding the chuck. It includes a projection optical system that projects light through an original onto the substrate. The apparatus is equipped with a first liquid supply nozzle positioned along the periphery of the final optical element and several second liquid supply nozzles on the stage. This innovative design allows for the efficient supply of liquid to the gap between the final optical element and the substrate, selecting the appropriate nozzle based on the exposure shot area's location.
Another notable patent is a substrate attracting and holding system for use in exposure apparatus. This method involves supporting a substrate using a protrusion on a holding table and reducing pressure between the holding table and the substrate to attract and hold it. The protrusion is strategically placed in relation to an alignment mark used for processing the substrate, ensuring precision in the manufacturing process.
Career Highlights
Hideki Nogawa is currently employed at Canon Kabushiki Kaisha, where he continues to innovate and develop advanced technologies. His work has significantly impacted the field of optical systems, enhancing the efficiency and effectiveness of exposure apparatus.
Collaborations
Throughout his career, Nogawa has collaborated with notable colleagues, including Izumi Tsukamoto and Itaru Fujita. These collaborations have fostered a creative environment that has led to groundbreaking advancements in their respective fields.
Conclusion
Hideki Nogawa's contributions to the field of exposure apparatus technology are noteworthy. His innovative patents and collaborations have positioned him as a leading inventor in the industry. His work continues to influence advancements in optical systems, showcasing the importance of innovation in technology.