The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2004
Filed:
Oct. 07, 2002
Yoshikazu Miyajima, Tochigi, JP;
Hideki Nogawa, Tochigi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus includes a movable stage, a chuck device which is arranged on the stage and holds a substrate, a first gas supply device for supplying a gas to a position of the substrate to be exposed, and a plurality of divided planar members which are arranged adjacent to a periphery of the substrate such that at least a part of the divided planar members covers a position measurement mirror of the movable stage, and are flush with or substantially flush with a surface of the substrate or a substrate holding surface of the chuck device.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile