The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2010
Filed:
Feb. 01, 2008
Izumi Tsukamoto, Tokyo, JP;
Hideki Nogawa, Utsunomiya, JP;
Izumi Tsukamoto, Tokyo, JP;
Hideki Nogawa, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus exposing a plurality of shot areas on a substrate to light through a liquid includes a movable stage including a chuck configured to hold the substrate and a plate arranged around of the chuck, a projection optical system configured to project a light through an original onto the substrate held by the chuck, a first liquid supply nozzle arranged along a periphery of a final optical element of the projection optical system, and a plurality of second liquid supply nozzles arranged on the stage. The exposure apparatus supplies the liquid to a gap between the final optical element and the substrate through the first liquid supply nozzle. The exposure apparatus selects a nozzle for supplying the liquid from among the plurality of the second liquid supply nozzles based on a location of an exposure shot area on the substrate.