The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 24, 2018

Filed:

Jun. 24, 2014
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Yoshikazu Miyajima, Utsunomiya, JP;

Yukio Takabayashi, Saitama, JP;

Shinichi Shudo, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 59/00 (2006.01); B29C 59/02 (2006.01); G03F 7/00 (2006.01); B29C 43/58 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B29C 43/58 (2013.01); B29C 59/002 (2013.01); B29C 59/02 (2013.01);
Abstract

An imprint method for transferring a pattern to an imprint material supplied to a plurality of shot areas on a substrate using a mold includes removing a foreign matter attached to a pattern of the mold in such a manner that the plurality of shot areas includes a part shot-area where a part of pattern of the mold can be formed and the mold is brought into contact with an imprint material supplied to the part shot-area to transfer the pattern of the mold to the substrate and transferring a pattern to the shot area excluding the part shot-area, among the plurality of shot areas, using the mold used in the removing the foreign matter.


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