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For the Inventor, By the Inventor

Austin, TX, United States of America

Mario Johannes Meissl

This inventor holds 54 USPTO granted patents and 9 published patent applications and 10 EPO patents, primarily in Nanoimprint Lithography (CPC class G03F). Top assignees: Molecular Imprints, Inc., Canon Kabushiki Kaisha, Canon Nanotechnologies, Inc.. Active years: 2004-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mario Johannes Meissl. Retrieved from https://idiyas.com/inventor/mario-johannes-meissl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 54 

% Patents Active = 88.9

 

Average Co-Inventor Count = 3.7

ph-index = 15

Forward Citations = 1,107(Granted Patents)

Forward Citations (Not Self Cited) = 976(Dec 10, 2025)


Inventors with similar research interests:


Company Filing History:

goldMedal29 out of 231 
 
Molecular Imprints, Inc.
 patents
silverMedal23 out of 93,136 
 
Canon Kabushiki Kaisha
 patents
bronzeMedal5 out of 34 
 
Canon Nanotechnologies, Inc.
 patents
4. 1 out of 834,601 
Other
 patents
where one patent can have more than one assignee

Years Active: 2004-2026

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Areas of Expertise:
Nanoimprint Lithography
Template Replication
Imprint Force Control
Adaptive Chucking System
Overlay Improvement
Curing Shaped Film
Uniform Light Intensity
Pressure Reduction
Separation Phase Control
Film Shaping
Substrate Gas Expulsion
Manufacturing Method
54 patents (USPTO):Explore Patents
1. 12740479 - Method of forming a die structure including a controlled thickness layer and an apparatus for performing the method (2026-09-15),
2. 12498634 - System and method for generating control values for overlay control of an imprint tool (2025-12-16),
3. 12463081 - Apparatus including a bonding head and a method of using the same (2025-11-04),
4. 12366800 - Method for improving accuracy of imprint force application in imprint lithography (2025-07-22),
5. 11994797 - System and method for shaping a film with a scaled calibration measurement parameter (2024-05-28),
6. 11776840 - Superstrate chuck, method of use, and method of manufacturing an article (2023-10-03),
7. 11656546 - Exposure apparatus for uniform light intensity and methods of using the same (2023-05-23),
8. 11614693 - Method of determining the initial contact point for partial fields and method of shaping a surface (2023-03-28),
9. 11604409 - Template replication (2023-03-14),
10. 11590687 - Systems and methods for reducing pressure while shaping a film (2023-02-28),
11. 11550216 - Systems and methods for curing a shaped film (2023-01-10),
12. 11480871 - Apparatus and method for improving accuracy of imprint force application in imprint lithography (2022-10-25),
13. 11454883 - Template replication (2022-09-27),
14. 11443940 - Apparatus for uniform light intensity and methods of using the same (2022-09-13),
15. 11347144 - Overlay improvement in nanoimprint lithography (2022-05-31),

Certainly! Here is the article about inventor Mario Johannes Meissl:

Title: Unveiling the Innovations of Mario Johannes Meissl from Austin, TX

Introduction: Mario Johannes Meissl, a prolific inventor based in Austin, Texas, has made significant contributions to the field of technology with an impressive portfolio of 49 patents.

Latest Patents: Among his recent patents is the 'Superstrate chuck' - a groundbreaking invention designed to retain a superstrate or a template with enhanced light transmission properties. Additionally, he developed an 'Exposure apparatus for uniform light intensity' that revolutionizes the method of forming a planarization layer on substrates.

Career Highlights: Mario's innovative spirit has been honed through his tenure at esteemed companies like Molecular Imprints, Inc. and Canon Kabushiki Kaisha, where he has played a pivotal role in driving technological advancements.

Collaborations: Throughout his career, Mario has collaborated with accomplished professionals such as Byung-Jin Choi and Sidlgata V Sreenivasan, pooling their expertise to push the boundaries of invention and innovation.

Conclusion: Mario Johannes Meissl's relentless pursuit of innovation and his impressive array of patents underscore his status as a visionary inventor at the forefront of technological advancement.

I hope you find this information about Mario Johannes Meissl insightful and engaging. If you have any more requests or need further information, feel free to let me know!

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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