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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9529274 B1

PDFFull Text
Date of Patent:
Dec. 27, 2016

Filed:

Dec. 15, 2014

Chucking system with recessed support feature

Applicants:

Canon Nanotechnologies, Inc., Austin, TX (US);

Molecular Imprints, Inc., Austin, TX (US);

Inventors:

Mahadevan GanapathiSubramanian, Cupertino, CA (US);

Mario Johannes Meissl, Austin, TX (US);

Avinash Panga, San Jose, CA (US);

Byung-Jin Choi, Austin, TX (US);

Assignees:

Canon Nanotechnologies, Inc., Austin, TX (US);

Molecular Imprints, Inc., Ausin, TX (US);

Attorney:

Cameron A. King

Primary Examiner:

Christina Riddle

Int. Cl.
CPC ...
G03B 27/60 (2006.01); G03B 27/02 (2006.01); G03B 27/20 (2006.01); G03F 7/20 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); G03F 7/00 (2006.01); B25B 11/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7035 (2013.01); B25B 11/005 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); G03F 7/0002 (2013.01); G03F 7/703 (2013.01); G03F 7/70375 (2013.01);
Abstract

In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.

Find Patent Forward Citations

GanapathiSubramanian, Mahadevan. (2016). Chucking system with recessed support feature (U.S. Patent No. 9529274). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9529274

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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