The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2017
Filed:
Nov. 21, 2008
Frank Y. Xu, Round Rock, TX (US);
Weijun Liu, Cedar Park, TX (US);
Edward Brian Fletcher, Austin, TX (US);
Sidlgata V. Sreenivasan, Austin, TX (US);
Byung Jin Choi, Austin, TX (US);
Niyaz Khusnatdinov, Round Rock, TX (US);
Anshuman Cherala, Austin, TX (US);
Kosta S. Selinidis, Austin, TX (US);
Frank Y. Xu, Round Rock, TX (US);
Weijun Liu, Cedar Park, TX (US);
Edward Brian Fletcher, Austin, TX (US);
Sidlgata V. Sreenivasan, Austin, TX (US);
Byung Jin Choi, Austin, TX (US);
Niyaz Khusnatdinov, Round Rock, TX (US);
Anshuman Cherala, Austin, TX (US);
Kosta S. Selinidis, Austin, TX (US);
Canon Nanotechnologies, Inc., Austin, TX (US);
Abstract
An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.