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For the Inventor, By the Inventor

Round Rock, TX, United States of America

Niyaz Khusnatdinov

This inventor holds 51 USPTO granted patents and 12 published patent applications and 5 EPO patents, primarily in Nanoimprint Lithography. Top assignees: Canon Kabushiki Kaisha, Molecular Imprints, Inc., Canon Nanotechnologies, Inc.. Active years: 2005-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Niyaz Khusnatdinov. Retrieved from https://idiyas.com/inventor/niyaz-khusnatdinov

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 51 

% Patents Active = 90.2

 

Average Co-Inventor Count = 2.5

ph-index = 6

Forward Citations = 218(Granted Patents)


Location History:

  • Acton, MA (US) (2005)
  • Round Rock, TX (US) (2007 - 2023)

Company Filing History:

goldMedal34 out of 93,085 
 
Canon Kabushiki Kaisha
 patents
silverMedal13 out of 231 
 
Molecular Imprints, Inc.
 patents
bronzeMedal6 out of 34 
 
Canon Nanotechnologies, Inc.
 patents
4. 1 out of 5,640 
 
The University of Texas System
 patents
5. 2 out of 834,570 
Other
 patents
where one patent can have more than one assignee

Years Active: 2005-2026

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Areas of Expertise:
Nanoimprint Lithography
Fluid Control
Pattern Formation
Substrate Pretreatment
Photo-Cured Layer
Drop Pattern Correction
Imprint Apparatus
Planarization System
Optical Components
Electrostatic Charge
Film Shaping
Curing Material
51 patents (USPTO):Explore Patents
1. 12675043 - Systems and methods for generating drop patterns (2026-07-07),
2. 12564987 - Apparatus and method for curing formable material (2026-03-03),
3. 12463042 - Planarization system and method (2025-11-04),
4. 12325046 - Superstrate including a body and layers and methods of forming and using the same (2025-06-10),
5. 12195382 - Superstrate and a method of using the same (2025-01-14),
6. 12152162 - Method of forming a photo-cured layer (2024-11-26),
7. 11590687 - Systems and methods for reducing pressure while shaping a film (2023-02-28),
8. 11402749 - Drop pattern correction for nano-fabrication (2022-08-02),
9. 11327397 - Pattern forming method, coating material for imprint pretreatment and substrate pretreatment method (2022-05-10),
10. 11294277 - Process of imprinting a substrate with fluid control features (2022-04-05),
11. 11281097 - Method for forming pattern by using photo-nanoimprint technology, imprint apparatus, and curable composition (2022-03-22),
12. 11249397 - Method of forming a cured layer by controlling drop spreading (2022-02-15),
13. 11247459 - Liquid charging apparatus, liquid charging method, and manufacturing method (2022-02-15),
14. 11209730 - Methods of generating drop patterns, systems for shaping films with the drop pattern, and methods of manufacturing an article with the drop pattern (2021-12-28),
15. 11161280 - Strain and kinetics control during separation phase of imprint process (2021-11-02),

Title: Niyaz Khusnatdinov: Innovator in Photocurable Technologies

Introduction

Niyaz Khusnatdinov, based in Round Rock, TX, is a prolific inventor with an impressive portfolio of 47 patents. His work primarily focuses on advancements in photocurable technologies and materials used in various processing sequences. Khusnatdinov's contributions to the field illustrate his commitment to innovation and excellence in engineering.

Latest Patents

One of Niyaz's latest patents is titled "Superstrate and a Method of Using the Same." This invention introduces a superstrate designed for forming a planarization layer on a substrate. It features a body with a first surface, a second surface opposite the first, and a chamfered edge between them. The invention includes an opaque layer that can coat the chamfered edge, enhancing the planarization process and reducing extrusion defects during processing.

Another recent patent is "Method of Forming a Photo-Cured Layer." This method involves utilizing two photocurable compositions that contain the same polymerizable monomers in different concentration ratios. This innovative approach compensates for the uneven evaporation of monomers in specific areas, ensuring a homogeneous material structure throughout the photo-cured layer.

Career Highlights

Throughout his career, Niyaz Khusnatdinov has worked with leading companies in the technology sector. He has made significant contributions at Canon, also known as Canon Kabushiki Kaisha, and Molecular Imprints, Inc. His experience in these organizations has allowed him to refine his skills and develop pioneering technologies that are widely recognized in the industry.

Collaborations

Niyaz has collaborated with talented professionals in his field, including Dwayne L LaBrake and Weijun Liu. Their joint efforts have led to groundbreaking advancements and a shared commitment to innovation within the realm of photocurable technologies.

Conclusion

Niyaz Khusnatdinov's extensive work and numerous patents reflect his dedication to pushing the boundaries of technology. His innovations in photocurable materials and methods are set to make a lasting impact in various applications. As he continues to advance his research and development efforts, the industry eagerly anticipates his future contributions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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